AS200A008C100CJCC Gas Mass Flow Controller Use for Semiconductor Manufacturing Process

AS200A008C100CJCC Gas Mass Flow Controller Use for Semiconductor Manufacturing Process Typical Applications Semiconductor processing, CVD, gas distribution systems, laboratory gas control, analytical instruments, etc. Specification: Leak rate 1×10⁻¹⁰ Pa·m³/s (He) Pressure resistance 3 MPa AS200 Product Series MEMS Gas Mass Flow Controller A (Seal Type) A = Rubber seal; Signal: 0–5V analog input/output 008 (Gas Code) 008 corresponds to the specified gas C (Range Unit) C = SCCM